Semiconductor · China · verified project

150 m³/h Ultrapure Water System for Semiconductor Manufacturing

A verified BAIHUIPU ultrapure-water project for a newly built semiconductor facility, engineered around a 150 m³/h production requirement and a defined high-purity water target.

Project overview

Engineering context and treatment approach

The project scope was developed for a newly built chip facility with continuous ultrapure-water demand. Customer identity is intentionally withheld; all technical values shown here are limited to the supplied project record.

Customer challenge

  • A high-purity target had to be maintained across a 150 m³/h production duty.
  • The plant required coordinated treatment, polishing and delivery planning within a compressed project schedule.
  • Materials and installation practices had to suit a clean manufacturing environment.

BAIHUIPU water treatment solution

  • BAIHUIPU configured pretreatment followed by first-pass RO, second-pass RO, EDI, polishing mixed bed, final UF and UV.
  • High-purity PVDF and 316L stainless-steel piping were specified in the supplied project record.
  • EDI and polishing equipment were installed with clean-area separation provisions.

Process flow

Raw waterPretreatmentFirst-pass ROSecond-pass ROEDIPolishing mixed bedFinal UF + UVPoint of use

Project highlights

  • Verified BAIHUIPU project record.
  • Continuous EDI and polishing stages for the stated high-purity target.
  • Treatment and piping scope aligned with clean manufacturing requirements.

Performance statement

The supplied project record reports resistivity of at least 18.2 MΩ·cm, TOC below 4 μg/L and compliant results across 72 hours of continuous sampling.

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